Lithography materials guidelines

Novel Resist Materials for next Generation Lithography

........................................................................................................................................................ ii Acknowledgments ....................................................................................................................................... iii Publications............................................................................

Femtosecond Laser Lithography in Organic and Non- Organic Materials

Large-area, infrared nanophotonic materials fabricated using interferometric lithography

Interferometric lithography IL is an ideal technique for the parallel fabrication of large-area periodic patterns at nanometer scales. Compared to other lithography techniques, IL has the optics advantage of parallel fabrication over large areas, resulting high efficiency and low cost. By combining IL with self-aligned semiconductor processing and epitaxial techniques, complicated nanoscale str...

Unctional Perfluoropolyethers as Novel Materials for Microfluidics and Soft Lithography

1 Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA 2 Department of Chemical Engineering, North Carolina State University, Raleigh, NC, 27695, USA 3 Department of Applied Physics, California Institute of Technology, Pasadena, CA, 91125, USA 4 IBM Almaden Research Center, Center for Polymeric Interfaces and Macromolecular Assemblies, 650 Harry Road...

Creating Active Device Materials for Nanoelectronics Using Block Copolymer Lithography

The prolonged and aggressive nature of scaling to augment the performance of silicon integrated circuits (ICs) and the technical challenges and costs associated with this has led to the study of alternative materials that can use processing schemes analogous to semiconductor manufacturing. We examine the status of recent efforts to develop active device elements using nontraditional lithography...